Magnetically Levitated Turbo Molecular Pumps
TG-ML SERIES
Ultra-Low Vibration Type Magnetically Levitated Turbo Molecular Pumps
Features
For advanced applications including analytical instruments, nanometrology, and next-generation semiconductor lithography that require an ultra-low vibration pump.
- Less than 1 nm in radial and axial vibration amplitude.
- With an external damper, less than 0.1 nm of vibration amplitude can be achieved.
Application
- Ultra High Resolution Electron Microscopy, Analytical Instruments, R&Ds
- E-Beam Lithography, EUV, XPS, CD linewidth tool, SEM/TEM
Specifications
Specifications
| Model | TG390ML | TG420ML | TG900ML | TG1300ML | ||
|---|---|---|---|---|---|---|
| Inlet | ISO-B100 / VG100 / CF100 | ISO-B160 / VG150 / CF160 | ISO-B160 / VG150 / CF160 | ISO-B200 / VG200 / CF200 | ||
| Outlet | KF25 | KF40 | ||||
| Volume flow rate | N₂(L/s) | 340 | 400 | 900 | 1300 | |
| N₂ (with protective screen) (L/s) | 320 | 370 | 860 | 1230 | ||
| H₂(L/s) | 290 | 300 | 1050 | 1200 | ||
| Max. compression ratio | N₂ | 1×10⁸ | ||||
| H₂ | 4.5×10³ | 1.5×10⁴ | ||||
| Base pressure | Pa | <1×10⁻⁶ (ISO-B・VG), <1×10⁻⁷ (CF) | ||||
| Torr | <7.5×10⁻⁹ (ISO-B・VG), <7.5×10⁻¹⁰ (CF) | |||||
| Startup time | min | 2~3 | 4~5 | |||
| Shutdown time | min | 4~5 | ||||
| Max. backing pressure | Pa | 400 | 500 | |||
| Torr | 3 | 3.8 | ||||
| Recommended backing vacuum pump | L/min | ≧160 | ≧250 | |||
| Weight (kg) | 14 (ISO-B・VG), 17 (CF) | 34 (ISO-B・VG), 42 (CF) | ||||
| Controller model | TC010MB | |||||
※1:This max throughput is based on a 320 L/min (TG390/420ML), 1000L/min (TG900/1300ML) backing pump.
※2:The performance curves are identical to those of the standard model. Please refer to the standard model for each type.
Dimensions
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Performance curve
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Controller
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